JPS6437035U - - Google Patents
Info
- Publication number
- JPS6437035U JPS6437035U JP13139887U JP13139887U JPS6437035U JP S6437035 U JPS6437035 U JP S6437035U JP 13139887 U JP13139887 U JP 13139887U JP 13139887 U JP13139887 U JP 13139887U JP S6437035 U JPS6437035 U JP S6437035U
- Authority
- JP
- Japan
- Prior art keywords
- exhaust
- plasma processing
- exhaust port
- gas
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims 4
- 239000012495 reaction gas Substances 0.000 claims 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13139887U JPS6437035U (en]) | 1987-08-31 | 1987-08-31 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13139887U JPS6437035U (en]) | 1987-08-31 | 1987-08-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6437035U true JPS6437035U (en]) | 1989-03-06 |
Family
ID=31387427
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13139887U Pending JPS6437035U (en]) | 1987-08-31 | 1987-08-31 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6437035U (en]) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100935144B1 (ko) * | 2006-12-20 | 2010-01-06 | 세이코 엡슨 가부시키가이샤 | 플라스마 처리 장치 |
JPWO2014129246A1 (ja) * | 2013-02-21 | 2017-02-02 | 株式会社 イアス | 基板のエッチング装置及び基板の分析方法 |
JP2018021216A (ja) * | 2016-08-01 | 2018-02-08 | 東京エレクトロン株式会社 | 成膜装置 |
-
1987
- 1987-08-31 JP JP13139887U patent/JPS6437035U/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100935144B1 (ko) * | 2006-12-20 | 2010-01-06 | 세이코 엡슨 가부시키가이샤 | 플라스마 처리 장치 |
JPWO2014129246A1 (ja) * | 2013-02-21 | 2017-02-02 | 株式会社 イアス | 基板のエッチング装置及び基板の分析方法 |
JP2018021216A (ja) * | 2016-08-01 | 2018-02-08 | 東京エレクトロン株式会社 | 成膜装置 |