JPS6437035U - - Google Patents

Info

Publication number
JPS6437035U
JPS6437035U JP13139887U JP13139887U JPS6437035U JP S6437035 U JPS6437035 U JP S6437035U JP 13139887 U JP13139887 U JP 13139887U JP 13139887 U JP13139887 U JP 13139887U JP S6437035 U JPS6437035 U JP S6437035U
Authority
JP
Japan
Prior art keywords
exhaust
plasma processing
exhaust port
gas
processed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13139887U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP13139887U priority Critical patent/JPS6437035U/ja
Publication of JPS6437035U publication Critical patent/JPS6437035U/ja
Pending legal-status Critical Current

Links

Landscapes

  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP13139887U 1987-08-31 1987-08-31 Pending JPS6437035U (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13139887U JPS6437035U (en]) 1987-08-31 1987-08-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13139887U JPS6437035U (en]) 1987-08-31 1987-08-31

Publications (1)

Publication Number Publication Date
JPS6437035U true JPS6437035U (en]) 1989-03-06

Family

ID=31387427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13139887U Pending JPS6437035U (en]) 1987-08-31 1987-08-31

Country Status (1)

Country Link
JP (1) JPS6437035U (en])

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100935144B1 (ko) * 2006-12-20 2010-01-06 세이코 엡슨 가부시키가이샤 플라스마 처리 장치
JPWO2014129246A1 (ja) * 2013-02-21 2017-02-02 株式会社 イアス 基板のエッチング装置及び基板の分析方法
JP2018021216A (ja) * 2016-08-01 2018-02-08 東京エレクトロン株式会社 成膜装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100935144B1 (ko) * 2006-12-20 2010-01-06 세이코 엡슨 가부시키가이샤 플라스마 처리 장치
JPWO2014129246A1 (ja) * 2013-02-21 2017-02-02 株式会社 イアス 基板のエッチング装置及び基板の分析方法
JP2018021216A (ja) * 2016-08-01 2018-02-08 東京エレクトロン株式会社 成膜装置

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